+A  Click here to enlarge/reduce to/back from full screen 
Paul Scherrer Institut PSI Laboratory for Micro- and Nanotechnology



Updated:
18.02.2011
E-Mail: celestino.padeste@psi.ch


Printer Friendly Printout without Logo or Navigation Elements available here... just click and print

X-ray Optics and Applications

 
Lab for Micro- and Nanotechnology, PSI

The X-Ray Optics and Applications group of LMN works on various fields of research which involve the control of x-rays with ultimate precision. We develop instrumentation for experiments at synchrotrons, x-ray free electron lasers, and x-ray tubes. This includes diffractive x-ray lenses (Fresnel zone plates) as well as refractive lenses for imaging and probing of matter on a micro- and nanometer scale. Our optics hold the resolution world record in x-ray microscopy.

In addition to focusing optics we fabricate diffractive gratings for the exposure of periodic nanostructures using extreme UV interference lithography. This unique method provides the smallest structures ever obtained by photon based lithography.

Interferometric imaging techniques using hard x-rays and cold neutron radiation also rely on specialized micro-fabricated gratings. The possibility to use this technique not only with synchrotron radiation but also with incoherent x-rays from tube sources makes the technique interesting for commercial applications.

Similar structures are applied in x-ray scattering investigations on nanofluidic systems to investigate the short-range structure liquid in confined geometries.

Topics

 

Front Cover of Nanotechnology, July 2010 These two images of structures produced with e-beam lithography at the LMN made it on the front covers of the july issues of the journal "nanotechnology".



Dense high aspect ratio hydrogen silsesquioxane nanostructures by 100 keV electron beam lithography

Font Cover of Nanotechnology, July 2010

Direct e-beam writing of dense and high aspect ratio nanostructures in thick layers of PMMA for electroplating